Dielectric Coated Plane Mirror DLHS 755-840 nm, Ti:Sa
LINOS® Dielectric-Coated Plane Mirrors DLHS 755–840 nm, Ti:Sa are precision optical components for high-power and high-energy laser applications, optimized for Ti:Sapphire lasers. Their broadband dielectric coating delivers high reflectivity and minimal scattering losses across the full high-reflectivity range. These mirrors support angles of incidence from 0° to 45° and are available in elliptical, circular, and rectangular shapes to suit various optical configurations. Manufactured from fused silica with highly polished surfaces, they offer excellent thermal stability and surface flatness in demanding conditions.
With guaranteed reflection exceeding 99 % across 755–840 nm, DLHS mirrors combine optical precision, durability, and long-term reliability, making them ideal for advanced laser systems, scientific research, and industrial high-power laser applications.
| Product | Laser Mirror DLHS755-840; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS755-840; Fused silica; D=25.4 | Laser Mirror DLHS755-840; Fused silica; D=20x30 | Laser Mirror DLHS755-840; Fused silica; D=50 |
| Weight (kg) | 0.008 | 0.008 | 0.003 | 0.043 |
| Shape | Circular | Circular | Circular | Circular |
| Optic Size | Ø 22.4 - 31.5 mm | Ø 25.4 mm | 20.0 - 30.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 2.5 mm | 10.0 mm |
| Wavelength Range | 755.0 - 840.0 nm | 755.0 - 840.0 nm | 755.0 - 840.0 nm | 755.0 - 840.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg |
| Substrate | Fused Silica | Fused Silica | Fused Silica | Fused Silica |
Ideal for high-power/high-energy applications ensuring reliable performance under intense laser conditions, and reducing the risk of damage or downtime
Broadband dielectric coating designed for Ti:Sapphire lasers
Polished back surface to minimize stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Use at 0–45° angle of incidence offers flexibility in optical design without compromising performance
Elliptical, circular, and rectangular plane mirrors provide shape options to fit diverse setups and mounting requirements
Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power
Guaranteed reflection > 99 % for the HR range 755 nm to 840 nm for 0° ≤ AOI ≤ 45° (average polarization)
Damage threshold H ∞ > 10 J/cm2 at 1064 nm with 11 ns laser pulses (s-on-1) at 10 Hz
| Product | Laser Mirror DLHS755-840; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS755-840; Fused silica; D=25.4 | Laser Mirror DLHS755-840; Fused silica; D=20x30 | Laser Mirror DLHS755-840; Fused silica; D=50 |
| Weight (kg) | 0.008 | 0.008 | 0.003 | 0.043 |
| Shape | Circular | Circular | Circular | Circular |
| Optic Size | Ø 22.4 - 31.5 mm | Ø 25.4 mm | 20.0 - 30.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 2.5 mm | 10.0 mm |
| Wavelength Range | 755.0 - 840.0 nm | 755.0 - 840.0 nm | 755.0 - 840.0 nm | 755.0 - 840.0 nm |
| Angle of Incidence (AOI) | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg | 0 - 45 deg |
| Substrate | Fused Silica | Fused Silica | Fused Silica | Fused Silica |
Ideal for high-power/high-energy applications ensuring reliable performance under intense laser conditions, and reducing the risk of damage or downtime
Broadband dielectric coating designed for Ti:Sapphire lasers
Polished back surface to minimize stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Use at 0–45° angle of incidence offers flexibility in optical design without compromising performance
Elliptical, circular, and rectangular plane mirrors provide shape options to fit diverse setups and mounting requirements
Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power
Guaranteed reflection > 99 % for the HR range 755 nm to 840 nm for 0° ≤ AOI ≤ 45° (average polarization)
Damage threshold H ∞ > 10 J/cm2 at 1064 nm with 11 ns laser pulses (s-on-1) at 10 Hz