G340757000

Dielectric-Coated Plane Mirrors DLHS 633 nm

LINOS® Dielectric-Coated Plane Mirrors DLHS 633 nm are precision optical components designed for high-power and high-energy laser applications. Featuring a dielectric high-power coating, these mirrors provide exceptionally high reflection with extremely low scattering losses, ensuring reliable performance in demanding beam steering and deflection tasks. Optimized for a 45° angle of incidence, they deliver precise 90° beam deflection and can also be used as dichroic or longpass mirrors for selective wavelength separation. Constructed on fused silica substrates with a highly polished front surface and polished back surface, they maintain excellent thermal and dimensional stability.

LINOS DLHS mirrors offer over 99.8% reflection at 633 nm, providing optical precision, durability, and long-term reliability. They are well-suited for advanced laser systems, scientific research, and high-power industrial use.

Product Laser Mirror DLHS633; Fused silica; D=12.7 Laser Mirror DLHS633; Fused silica; D=22.4x31.5 elliptical Laser Mirror DLHS633; Fused silica; D=25
Weight (kg) 0.003 0.008 0.008
Shape Circular Circular Circular
Optic Size Ø 12.7 mm Ø 22.4 - 31.5 mm Ø 25.0 mm
Optic Center Thickness 5.0 mm 5.0 mm 5.0 mm
Wavelength Range 633.0 nm 633.0 nm 633.0 nm
Angle of Incidence (AOI) 45 deg 45 deg 45 deg
Substrate Fused Silica Fused Silica Fused Silica
Parallelism 5.0 5.0 5.0
  • Dielectric high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime

  • Beam steering mirror for 45° angle of incidence, 90° beam deflection

  • Also suitable as Dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups

  • Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy

  • Extreme low scattering losses preserves beam intensity and uniformity for precision applications

  • Fused silica substrate ensures high thermal stability and minimal distortion, even under high laser power

  • Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality

  • Guaranteed reflection > 99.8 % at 633 nm for AOI = 45° (average polarization)

  • Transmission > 80 % for λ between 850 nm and 1200 nm allows efficient passage of secondary wavelengths, supporting dual-wavelength applications; Transmission > 90% can be achieved with an additional anti-reflection (AR) coating on the backside

  • Damage threshold H > 10 J / cm2 at 532 nm with 15 ns laser pulses (s-on-1) at 10 Hz

Product Laser Mirror DLHS633; Fused silica; D=12.7 Laser Mirror DLHS633; Fused silica; D=22.4x31.5 elliptical Laser Mirror DLHS633; Fused silica; D=25
Weight (kg) 0.003 0.008 0.008
Shape Circular Circular Circular
Optic Size Ø 12.7 mm Ø 22.4 - 31.5 mm Ø 25.0 mm
Optic Center Thickness 5.0 mm 5.0 mm 5.0 mm
Wavelength Range 633.0 nm 633.0 nm 633.0 nm
Angle of Incidence (AOI) 45 deg 45 deg 45 deg
Substrate Fused Silica Fused Silica Fused Silica
Parallelism 5.0 5.0 5.0
  • Dielectric high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime

  • Beam steering mirror for 45° angle of incidence, 90° beam deflection

  • Also suitable as Dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups

  • Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy

  • Extreme low scattering losses preserves beam intensity and uniformity for precision applications

  • Fused silica substrate ensures high thermal stability and minimal distortion, even under high laser power

  • Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality

  • Guaranteed reflection > 99.8 % at 633 nm for AOI = 45° (average polarization)

  • Transmission > 80 % for λ between 850 nm and 1200 nm allows efficient passage of secondary wavelengths, supporting dual-wavelength applications; Transmission > 90% can be achieved with an additional anti-reflection (AR) coating on the backside

  • Damage threshold H > 10 J / cm2 at 532 nm with 15 ns laser pulses (s-on-1) at 10 Hz

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