Dielectric-Coated Plane Mirrors DLHS NIR 1064 nm
LINOS® DLHS NIR 1064 nm Dielectric-Coated Plane Mirrors are designed for high-power and high-energy laser applications. They deliver exceptional reliability and optical performance. Their advanced dielectric NIR coating resists laser-induced damage and ensures reflection above 99.8%. These mirrors are made for a 45° angle of incidence and provide precise 90° beam deflection. They also serve as short-pass or dichroic elements in complex optical setups.
The fused silica substrate offers excellent thermal and mechanical stability. The super-polished front surface, with an RMS roughness of ≤ 1 nm, minimizes scatter and maintains beam quality. These mirrors deliver very low scattering losses, making them ideal for precision beam steering in high-performance laser systems.
| Product | Laser Mirror DLHS1064; Fused silica; D=12.7 | Laser Mirror DLHS1064; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS1064; Fused silica; D=25 | Laser Mirror DLHS1064; Fused silica; D=50 |
| Weight (kg) | 0.003 | 0.008 | 0.008 | 0.043 |
| Shape | Circular | Circular | Circular | Circular |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm | Ø 25.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 5.0 mm | 10.0 mm |
| Wavelength Range | 1064.0 nm | 1064.0 nm | 1064.0 nm | 1064.0 nm |
| Angle of Incidence (AOI) | 45 deg | 45 deg | 45 deg | 45 deg |
| Coating Specification |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
| Substrate | Fused Silica | Fused Silica | Fused Silica | Fused Silica |
| Parallelism | 5.0 | 5.0 | 5.0 | 5.0 |
Dielectric UV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99.8 % for 1064 nm for AOI = 45° (average polarization)
Transmission > 80 % for λ = 532 nm and 810 nm enables efficient transmission of secondary wavelengths, supporting dual-wavelength applications; Transmission > 90% can be achieved with an additional anti-reflection (AR) coating on the backside
Damage threshold H∞ > 30 J/cm2 at 1064 nm with 11 ns laser pulses (s-on-1) at 10 Hz






| Product | Laser Mirror DLHS1064; Fused silica; D=12.7 | Laser Mirror DLHS1064; Fused silica; D=22.4x31.5 elliptical | Laser Mirror DLHS1064; Fused silica; D=25 | Laser Mirror DLHS1064; Fused silica; D=50 |
| Weight (kg) | 0.003 | 0.008 | 0.008 | 0.043 |
| Shape | Circular | Circular | Circular | Circular |
| Optic Size | Ø 12.7 mm | Ø 22.4 - 31.5 mm | Ø 25.0 mm | Ø 50.0 mm |
| Optic Center Thickness | 5.0 mm | 5.0 mm | 5.0 mm | 10.0 mm |
| Wavelength Range | 1064.0 nm | 1064.0 nm | 1064.0 nm | 1064.0 nm |
| Angle of Incidence (AOI) | 45 deg | 45 deg | 45 deg | 45 deg |
| Coating Specification |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
1x R>99.8% @1064 nm, T>80% @532 nm 1x uncoated |
| Substrate | Fused Silica | Fused Silica | Fused Silica | Fused Silica |
| Parallelism | 5.0 | 5.0 | 5.0 | 5.0 |
Dielectric UV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime
Beam steering mirror for 45° angle of incidence, 90° beam deflection
Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups
Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy
Extreme low scattering losses preserves beam intensity and uniformity for precision applications
Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power
Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality
Guaranteed reflection > 99.8 % for 1064 nm for AOI = 45° (average polarization)
Transmission > 80 % for λ = 532 nm and 810 nm enables efficient transmission of secondary wavelengths, supporting dual-wavelength applications; Transmission > 90% can be achieved with an additional anti-reflection (AR) coating on the backside
Damage threshold H∞ > 30 J/cm2 at 1064 nm with 11 ns laser pulses (s-on-1) at 10 Hz






