Laser Mirror DLHS1064; Fused silica; D=50 (G340765000)

Dielectric-Coated Plane Mirrors DLHS NIR 1064 nm

LINOS® DLHS NIR 1064 nm Dielectric-Coated Plane Mirrors are designed for high-power and high-energy laser applications. They deliver exceptional reliability and optical performance. Their advanced dielectric NIR coating resists laser-induced damage and ensures reflection above 99.8%. These mirrors are made for a 45° angle of incidence and provide precise 90° beam deflection. They also serve as short-pass or dichroic elements in complex optical setups.

The fused silica substrate offers excellent thermal and mechanical stability. The super-polished front surface, with an RMS roughness of ≤ 1 nm, minimizes scatter and maintains beam quality. These mirrors deliver very low scattering losses, making them ideal for precision beam steering in high-performance laser systems.

Product Laser Mirror DLHS1064; Fused silica; D=12.7 Laser Mirror DLHS1064; Fused silica; D=22.4x31.5 elliptical Laser Mirror DLHS1064; Fused silica; D=25 Laser Mirror DLHS1064; Fused silica; D=50
Weight (kg) 0.003 0.008 0.008 0.043
Shape Circular Circular Circular Circular
Optic Size Ø 12.7 mm Ø 22.4 - 31.5 mm Ø 25.0 mm Ø 50.0 mm
Optic Center Thickness 5.0 mm 5.0 mm 5.0 mm 10.0 mm
Wavelength Range 1064.0 nm 1064.0 nm 1064.0 nm 1064.0 nm
Angle of Incidence (AOI) 45 deg 45 deg 45 deg 45 deg
Coating Specification 1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
Substrate Fused Silica Fused Silica Fused Silica Fused Silica
Parallelism 5.0 5.0 5.0 5.0
  • Dielectric UV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime

  • Beam steering mirror for 45° angle of incidence, 90° beam deflection

  • Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups

  • Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy

  • Extreme low scattering losses preserves beam intensity and uniformity for precision applications

  • Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power

  • Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality

  • Guaranteed reflection > 99.8 % for 1064 nm for AOI = 45° (average polarization)

  • Transmission > 80 % for λ = 532 nm and 810 nm enables efficient transmission of secondary wavelengths, supporting dual-wavelength applications; Transmission > 90% can be achieved with an additional anti-reflection (AR) coating on the backside

  • Damage threshold H > 30 J/cm2 at 1064 nm with 11 ns laser pulses (s-on-1) at 10 Hz

Product Laser Mirror DLHS1064; Fused silica; D=12.7 Laser Mirror DLHS1064; Fused silica; D=22.4x31.5 elliptical Laser Mirror DLHS1064; Fused silica; D=25 Laser Mirror DLHS1064; Fused silica; D=50
Weight (kg) 0.003 0.008 0.008 0.043
Shape Circular Circular Circular Circular
Optic Size Ø 12.7 mm Ø 22.4 - 31.5 mm Ø 25.0 mm Ø 50.0 mm
Optic Center Thickness 5.0 mm 5.0 mm 5.0 mm 10.0 mm
Wavelength Range 1064.0 nm 1064.0 nm 1064.0 nm 1064.0 nm
Angle of Incidence (AOI) 45 deg 45 deg 45 deg 45 deg
Coating Specification 1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
1x R>99.8% @1064 nm, T>80% @532 nm
1x uncoated
Substrate Fused Silica Fused Silica Fused Silica Fused Silica
Parallelism 5.0 5.0 5.0 5.0
  • Dielectric UV high-power–coated mirror designed for high-energy laser applications, providing stable performance under high laser intensities and minimizing the risk of optical damage or system downtime

  • Beam steering mirror for 45° angle of incidence, 90° beam deflection

  • Also suitable as dichroic / longpass provides versatile functionality, enabling flexible integration in multi-wavelength setups

  • Polished back surface minimizes stray reflections and scattering, improving beam quality and measurement accuracy

  • Extreme low scattering losses preserves beam intensity and uniformity for precision applications

  • Fused silica substrates ensures high thermal stability and minimal distortion, even under high laser power

  • Front surface RMS ≤ 1 nm polished minimizes scattering and wavefront distortion, maintaining high beam quality

  • Guaranteed reflection > 99.8 % for 1064 nm for AOI = 45° (average polarization)

  • Transmission > 80 % for λ = 532 nm and 810 nm enables efficient transmission of secondary wavelengths, supporting dual-wavelength applications; Transmission > 90% can be achieved with an additional anti-reflection (AR) coating on the backside

  • Damage threshold H > 30 J/cm2 at 1064 nm with 11 ns laser pulses (s-on-1) at 10 Hz

Close